Atomic Layer Etching and Deposition (Thermal and Plasma Assisted)
Orientation-Dependent Etching and Deposition
Are-Selective Deposition
Magnetron Sputtering
Synthesis of Nanostructures by Thermal and Non-Equilibrium Plasmas
Supporting micro-nanoelectronics industry R&D:
Design of plasma processing chambers
Plasma behavior features in process chambers
Proprietary custom applications:
Plasma and gas diagnostics
Process conditions optimization
Experimental Validation and Proof of concept of plasma process models
Plasma chemistry development
Surface chemistry development
Precursors and etchants design
Recombination, coefficients calculations
Magnetron Sputtering
Multi-scale modelling