PLASMA PROCESS RESEARCH

Silicon Valley

Team of industry experts in plasma process chemistry, physics, engineering, R&D

Modeling of physical and chemical processes in plasma chambers

Generating insights for micro- and nanofabrication process engineering and development

Supporting micro-nanoelectronics industry R&D

Applicable industry areas:

Atomic Layer Etching and Deposition (Thermal and Plasma Assisted)

Orientation-Dependent Etching and Deposition 

Are-Selective Deposition 

Magnetron Sputtering

Synthesis of Nanostructures by Thermal and Non-Equilibrium Plasmas 

APPLICATION software:

CFDAce VizGlowGaussianOrcaGAMESSVASPCrystalCP2K

Supporting micro-nanoelectronics industry R&D:


Design of plasma processing chambers

Plasma behavior features in process chambers

Proprietary custom applications:

Plasma and gas diagnostics

Process conditions optimization

Experimental Validation and Proof of concept of plasma process models

Plasma chemistry development

Surface chemistry development

Precursors and etchants design

Recombination, coefficients calculations

Magnetron Sputtering

Multi-scale modelling